Atomic layer depositioning systems

Atomic Layer Depositioning (ALD) provides precise control at an atomic scale. It holds great
potential across various industries, including energy, optics, electronics, nanostructures, biomedical, and more. The principle of ALD is similar to chemical vapor deposition (CVD),
with the key difference being that the ALD reaction breaks down the CVD reaction into two
half-reactions, thereby keeping the precursor materials separate during the process.

ALD is the leading deposition method in the market, enabling the creation of highly precise
ultra-thin films with remarkable material quality, uniformity, and conformality. ALD stands
out as one of the rapidly expanding segments in the wafer fab equipment market.

Vactec offers a comprehensive range of ALD systems for both research and production
purposes. The Savannah system is an affordable and reliable research workhorse, while Fiji
provides advanced experimentation capabilities, such as plasma-enhanced ALD. For production ALD capacity, our Phoenix systems are the ideal choice. But we don’t just offer
great products. Vactec is also known for our excellent customer service and technical support.
So when you choose Vactec, you’re not just choosing a product, but also a reliable partner that
helps you achieve your ambitions.