The FC2000 PVD system provides:
– Full integrated and automated deposition system, including datalogging of deposition parameters, development of deposition recipes and automated control of all functionality of pumps, valves, guns, ionsource, sample heating, cooling, etc.
– Excellent access of the e-gun through swingout electronbeam gun chamber
– Reliable highvacuum pumpingsystem with cryopump and compressor
– Extreme fast pumpdown through loadlocked sampleholder chamber
– Excellent uniformity by Rotary sample holder and >50cm Source to Substrate distance
– Virtual no cross-contamination between materials by unique turretgun design
– Reliable and powerfull High Voltage powersupply, 6, 12 or 15kW.
– 500 mm hinged loadlock belljar
– ultimate vacuum < 5E-8 mbar
– 550 mm Source-to-Substrate distance
– Temescal STIH270-2 poptop egun, with 6kW high voltage powersupply
– Dry backingpump 40 m3/hr
– Cryopump 1500 l/sec
– PLC control with touchscreen
– Inficon deposition controller