The Savannah series of thin film deposition systems has become the standard for ALD research and development. Savannah combines ease of use and great
experimental flexibility into a compact, inexpensive package.
The Savannah ALD system can deposit a wide range of thin films such as oxides, nitrides, sulfides as well as Self Assembling Monolayer in the same reactor.
Savannah series is ideal if you are looking for an affordable, reliable ALD system.
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Savannah G2 Technical specifications
Substrate Size | Savannah S100: up to 100 mm Savannah S200: up to 200 mm Savannah S300: up to 300 mm |
Dimensions (w x d x h) | Savannah S100: 585 x 560 x 980 mm Savannah S200: 585 x 560 x 980 mm Savannah S300: 686 x 560 x 980 mm |
Cabinet | Steel with white powder coat paint with removable panels and lockable precursor door |
Operational Modes | Continuous Mode™ (high speed) or Exposure Mode™ (ultra-high aspect ratio) |
Power | 115 VAC or 220 VAC,1500 W (excluding pump) |
Controls | LabVIEW™, Windows™ 7, Lenovo Laptop, USB control |
Maximum Substrate Temperature | S100: RT – 400 °C S200: RT – 350 °C S300: RT – 350 °C |
Deposition Uniformity | (Al2O3) <1% (1σ) |
Cycle Time | <2 seconds per cycle with Al2O3 at 200 °C |
Vacuum Pump | Alcatel 2021C2 – 14.6 CFM |
Compatibility | Clean room class 100 compatible |
Compliance | CE, TUV, FCC |
Precursor Delivery System, Ports | 2 lines standard, up to 6 lines available Each line accommodates solid, liquid and gas precursors Lines can be independently heated up to 200 °C |
Precursor Delivery System, Valves | Industry standard high speed ALD valves with 10 msec response time |
Precursor Cylinders | Individually heated 50 ml stainless steel cylinders, optional larger cylinders available |
Carrier/Venting Gas | N2 mass flow controlled, 100 SCCM |
Options | Low Vapor Pressure Delivery (LVPD) System Ozone Generator Dome lid for wafer cassette or 3D objects Glove box Interface In-Situ Ellipsometry In-Situ Quartz Crystal MicroBalance (QCM) Self Assembling Monolayers (SAMs) Particle Coating |