Savannah G2 ALD Tool

The Savannah series of thin film deposition systems has become the standard for ALD research and development. Savannah combines ease of use and greatSavannah G2
experimental flexibility into a compact, inexpensive package.

The Savannah ALD system can deposit a wide range of thin films such as oxides, nitrides, sulfides as well as Self Assembling Monolayer in the same reactor.

Savannah series is ideal if you are looking for an affordable, reliable ALD system.

Download datasheet.

Savannah G2 Technical specifications

Substrate Size Savannah S100: up to 100 mm
Savannah S200: up to 200 mm
Savannah S300: up to 300 mm
Dimensions (w x d x h) Savannah S100: 585 x 560 x 980 mm
Savannah S200: 585 x 560 x 980 mm
Savannah S300: 686 x 560 x 980 mm
Cabinet Steel with white powder coat paint with removable panels and lockable precursor door
Operational Modes Continuous Mode™ (high speed) or Exposure Mode™ (ultra-high aspect ratio)
Power 115 VAC or 220 VAC,1500 W (excluding pump)
Controls LabVIEW™, Windows™ 7, Lenovo Laptop, USB control
Maximum Substrate Temperature S100: RT – 400 °C
S200: RT – 350 °C
S300: RT – 350 °C
Deposition Uniformity (Al2O3) <1% (1σ)
Cycle Time <2 seconds per cycle with Al2O3 at 200 °C
Vacuum Pump Alcatel 2021C2 – 14.6 CFM
Compatibility Clean room class 100 compatible
Compliance CE, TUV, FCC
Precursor Delivery System, Ports 2 lines standard, up to 6 lines available
Each line accommodates solid, liquid and gas precursors
Lines can be independently heated up to 200 °C
Precursor Delivery System, Valves Industry standard high speed ALD valves with 10 msec response time
Precursor Cylinders Individually heated 50 ml stainless steel cylinders, optional larger cylinders available
Carrier/Venting Gas N2 mass flow controlled, 100 SCCM
Options Low Vapor Pressure Delivery (LVPD) System
Ozone Generator
Dome lid for wafer cassette or 3D objects
Glove box Interface
In-Situ Ellipsometry
In-Situ Quartz Crystal MicroBalance (QCM)
Self Assembling Monolayers (SAMs)
Particle Coating